Patents
Year : 2012
Jean-Baptiste VU VAN : Connect in order to contact the contributor
https://utt.hal.science/hal-03141933
Submitted on : Monday, February 15, 2021-4:06:09 PM
Last modification on : Friday, March 24, 2023-2:53:20 PM
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- HAL Id : hal-03141933 , version 1
Cite
Gilles Lerondel, Laurent Divay. Method of nanostructuring a film or a wafer of material of the metal oxide or semiconductor type. United States, Patent n° : US2012133029 (A1). 2012. ⟨hal-03141933⟩
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