Electrical and Structural properties of Cu2O thin films deposited at different temperatures by magnetron sputtering - Université de technologie de Troyes Access content directly
Conference Poster Year : 2016

Electrical and Structural properties of Cu2O thin films deposited at different temperatures by magnetron sputtering

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hal-02870949 , version 1 (17-06-2020)

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  • HAL Id : hal-02870949 , version 1

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Lamia Radjehi, Salim Lamri, Abdelkader Djelloul, Frédéric Sanchette. Electrical and Structural properties of Cu2O thin films deposited at different temperatures by magnetron sputtering. 15th International Conference on Plasma Surface Engineering, Sep 2016, Garmisch-Partenkirchen, Germany. ⟨hal-02870949⟩
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