Method of nanostructuring a film or a wafer of material of the metal oxide or semiconductor type - Université de technologie de Troyes Access content directly
Patents Year : 2012

Method of nanostructuring a film or a wafer of material of the metal oxide or semiconductor type

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hal-02866026 , version 1 (12-06-2020)

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  • HAL Id : hal-02866026 , version 1

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Gilles Lerondel, Laurent Divay. Method of nanostructuring a film or a wafer of material of the metal oxide or semiconductor type. Unknown Region, Patent n° : EP2430220 (A1). 2012. ⟨hal-02866026⟩

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