Method for integrating two-dimensional materials on a nanostructured substrate, suspended thin film of two-dimensional materials and uses there of - Université de technologie de Troyes Accéder directement au contenu
Brevet Année : 2018

Method for integrating two-dimensional materials on a nanostructured substrate, suspended thin film of two-dimensional materials and uses there of

Fichier non déposé

Dates et versions

hal-02866007 , version 1 (12-06-2020)

Identifiants

  • HAL Id : hal-02866007 , version 1

Citer

Gilles Lerondel, Hyun Jeong, Anisha Gokarna. Method for integrating two-dimensional materials on a nanostructured substrate, suspended thin film of two-dimensional materials and uses there of. Unknown Region, Patent n° : WO2018116048 (A1). 2018. ⟨hal-02866007⟩

Collections

CNRS UTT
22 Consultations
0 Téléchargements

Partager

Gmail Facebook X LinkedIn More