Influence of film thickness and Ar N2 plasma gas on the structure and performance of sputtered vanadium nitride coatings - Université de technologie de Troyes Access content directly
Journal Articles Surface and Coatings Technology Year : 2019

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hal-02290546 , version 1 (20-07-2022)

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Attribution - NonCommercial

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Linda Aissani, Akram Alhussein, Corinne Nouveau, Laala Ghelani, Mourad Zaabat. Influence of film thickness and Ar N2 plasma gas on the structure and performance of sputtered vanadium nitride coatings. Surface and Coatings Technology, 2019, 378, pp.124948. ⟨10.1016/j.surfcoat.2019.124948⟩. ⟨hal-02290546⟩
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