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Structure: Internal structure identifier : 542010

Large scale sub-100 nm 2D nanostructuring obtained by nanosphere lithography combined with metal evaporation and reactive ion etching

Hind Kadiri , Marco Faustini , Daniel Turover , David Grosso , Gilles Lerondel
JNTE215 4èmes Journées Nationales sur les Technologies Emergentes en micro-nanofabrication, Nov 2015, Ecully, France
Conference papers hal-02866321v1

Advanced large scale colloidal lithography for sub-100 nm direct and indirect structuring: application to silicon and metals

Hind Kadiri , Marco Faustini , Daniel Turover , David Grosso , Anisha Gokarna , et al.
Tech connect World Innovation Conference & Expo, Jun 2015, Washington, United States
Conference papers hal-02866188v1

Nanostructuration by nanoimprint lithography of hybrid silica coatings

Alban Letailleur , Cedric Boissiere , François Ribot , Clément Sanchez , Jérémie Teisseire , et al.
Nanoimprint and Nanoprint Technology (NNT), Oct 2010, Copenhague, Denmark
Conference papers hal-02526413v1

Method for manufacturing a thin film of ordered silicon nanopatterns

David Grosso , Cedric Boissiere , Gilles Lerondel
Unknown Region, Patent n° : EP2875522 (B1). 2020
Patents hal-03141741v1

Light extraction study on quantum dots embedded in nanoimprinted silica matrix

Alban Letailleur , Thomas Richardot , François Ribot , Cedric Boissiere , Clément Sanchez , et al.
Nanoimprint and Nanoprint Technology (NNT), Oct 2010, Copenhague, Denmark
Conference papers hal-02526421v1