New photopolymer material based on PMMA for Near field nano-lithography - Université de technologie de Troyes Access content directly
Conference Papers Year : 2009
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hal-02498919 , version 1 (04-03-2020)

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  • HAL Id : hal-02498919 , version 1

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Safi Jradi, Carlo Vincienzo Genuino Dajac, Xinhua Zeng, Jerome Plain, Renaud Bachelot, et al.. New photopolymer material based on PMMA for Near field nano-lithography. Frontiers in Polymer Science, Jun 2009, Mayence, Germany. ⟨hal-02498919⟩

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