@article{gwiazda:hal-02448435, TITLE = {{Simple and Versatile High Aspect Ratio Nanostructuring via Zinc Oxide Masking}}, AUTHOR = {Gwiazda, Agnieszka and Rumyantseva, Anna and Gokarna, Anisha and Nomenyo, Komla and Chevalier-C{\'e}sar, Clotaire and Lerondel, Gilles}, URL = {https://utt.hal.science/hal-02448435}, JOURNAL = {{Advanced Materials Technologies}}, PUBLISHER = {{Wiley}}, VOLUME = {2}, NUMBER = {9}, PAGES = {1700107}, YEAR = {2017}, MONTH = Sep, DOI = {10.1002/admt.201700107}, KEYWORDS = {laser interference lithography ; nanostructures ; silicon etching ; silicon nanostructuring ; ZnO}, HAL_ID = {hal-02448435}, HAL_VERSION = {v1}, }