%0 Journal Article %T Principle of Apertureless Scanning Near-Field Optical Microscopy: On the Way to the Optical Metrology of Nanostructures %+ Laboratoire de Nanotechnologie et d'Instrumentation Optique (LNIO) %A Barchiesi, Dominique %A Grimault, Anne-Sophie %A Grosges, Thomas %A Macías, Demetrio %A Vial, Alexandre %< avec comité de lecture %@ 0374-4884 %J Journal of the Korean Physical Society %I Korean physical society %V 47 %P S166-S174 %8 2005-08-30 %D 2005 %K Near-field %K Metrology %K Finite element method %K Finite difference time domain %K Inverse problem %K Numerical modeling %K Diffraction %K Scattering %K Classical electromagnetism %K Maxwell’s equations %Z Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics %Z Engineering Sciences [physics]/Optics / Photonic %Z Engineering Sciences [physics]/Signal and Image processingJournal articles %X Apertureless Scanning Near-Field Optical Microscopy (A-SNOM) is a powerful tool for the observationand engineering of nanostructures in near-field optics (NFO). Nevertheless, the interpretationof the experimental recorded signals raises several difficulties due to the strong dependance of theimage formation process on the shape and the optical index of the nanostructure, the properties ofthe probe and also on the illumination and detection conditions of the experimental configurationused. In order to perform an optical measurement, an accurate model and an inversion procedureare necessary. This last approach may offer a wide variety of applications to the SNOM (e.g. themetrology of nanostructures, the optical, thermal properties, or of optical forces...) In this contribution,we focus our attention on an A-SNOM model for metrological applications in near-fieldoptics. %G English %L hal-02285211 %U https://utt.hal.science/hal-02285211 %~ CNRS %~ UNIV-TROYES %~ UTT